Our Services

Three Basic Proposals

Fast and simple – Components

  • Treat components to compare performance before and after treatment.
  • Improve interfaces, unlocking 10% to 40% of potential.
  • KPI: Leakage current.
  • Proposed sample amount: 12 chips.

In-Depth – Surface quality

  • Analyze wafer surface quality and composition.
  • Improve surface quality at the atomic level.
  • KPIs: Defects, contaminants, surface structure.
  • Proposed sample amount: 2-3 reference wafers for pre-measurements, 2-3 SisuSemi treated wafers for post-measurements.

Feasibility – wafers

  • Integrate SisuSemi solution into a critical process step.
  • Demonstrate yield and performance improvement.
  • KPIs: Component performance, chip-to-chip variation, yield.
  • Proposed sample amount: Starting from 5 wafers for treatment (+ control wafers), or at least 1 wafer per recipe if multiple recipes are studied.
ASK FOR A QUOTE
Scientist in cleanroom suit writing semiconductor process flow and data analysis graphs on whiteboard
High-vacuum chamber system for semiconductor surface analysis and material characterization with multiple ports and sensors

Pre-measurements

Measure samples before treatment.

If preferred, we can continue straight to analysis and insights after this stage.

Scientist in cleanroom suit operating high-vacuum semiconductor equipment with touchscreen interface and complex tubing system
High-vacuum chamber system for semiconductor surface analysis and material characterization with multiple ports and sensors

Post-measurements

Measure improvements e.g. in surface quality and leakage current.

Two scientists analyzing semiconductor data on a computer screen in a research lab environment

Samples to Customer

Continue the process at your facility.