In the world of semiconductors, ensuring that current flows precisely through the active area is essential. But what happens when it leaks through the edges? This common issue, known as leakage current, can significantly impact device performance and reliability.

Sources of Leakage Current

Leakage current in semiconductors generally arises from multiple sources:

  • Defects in the insulator
  • Free electrons or holes at the surface and interface due to existing defects and lack of passivation
  • Defects caused at the edges of the component during the dicing process

For example, H. Xia et al. explored sidewall chipping and its impact in their study, “Sidewall Chipping Investigation & Challenges on 100um Thin Low-K Wafer with DAF”. Their work shows that even with optimized dicing processes or expensive plasma dicing, achieving a perfectly diced sidewall with near-zero chipping remains a challenge.

Even without chipping, the diced sidewall is exposed to contaminants and lacks a passivation layer, making it a persistent source of leakage current.

Novel Atomic-Level Solution

One effective approach to address leakage current at diced sidewalls is atomic-level cleaning and passivation. SisuSemi’s solutions are designed to:

  • Clean and passivate diced sidewalls
  • Reduce atomic-level defects under existing insulator surfaces
  • Improve surface smoothness and atomic structure order
  • Grow a thin, crystalline SiO₂ layer to minimize defects and leakage

With SisuSemi’s treatment, significant reductions in leakage currents have been demonstrated. This process is not limited to sidewalls—it can also be applied after dry etching or other fabrication steps to enhance surface cleanliness, structural ordering, and passivation.

Benefits of SisuSemi’s Solution

  • Lower power consumption due to reduced leakage
  • Higher manufacturing yield by mitigating defect-related losses
  • Longer product lifetime and improved reliability
  • Support for sustainable semiconductor production

SisuSemi’s solution offers a versatile tool that addresses multiple atomic-level cleanliness challenges across semiconductor manufacturing steps, ensuring higher performance, reliability, and efficiency.

Ready to revolutionize your semiconductor manufacturing? Contact us today to learn more about our innovative solutions.